CNTech Publications List

2000 - 2005 | 1990 - 1999 | 1980 - 1989 | 1970 - 1979

1. Que, L; Gianchandani, Yb; Cerrina, F, Mechanical Characterization Of Electron-Beam Resist Using Micromachined Structures, Journal Of Vacuum Science & Technology B, 2719–2722, 17, 1999
2. Bollepalli, Sb; Khan, M; Cerrina, F, Image Formation In Extreme Ultraviolet Lithography And Numerical Aperture Effects, Journal Of Vacuum Science & Technology B, 2992–2997, 17, 1999
3. Solak, Hh; He, D; Li, W; Cerrina, F, Nanolithography Using Extreme Ultraviolet Lithography Interferometry: 19 Nm Lines And Spaces, Journal Of Vacuum Science & Technology B, 3052–3057, 17, 1999
4. Lu, B; Taylor, Jw; Cerrina, F; See, Cp; Bourdillon, Aj, Study Of Acid Diffusion In A Positive Tone Chemically Amplified Resist Using An On-Wafer Imaging Technique, Journal Of Vacuum Science & Technology B, 3345–3350, 17, 1999
5. He, D; Solak, H; Li, W; Cerrina, F, Extreme Ultraviolet And X-Ray Resist: Comparison Study, Journal Of Vacuum Science & Technology B, 3379–3383, 17, 1999
6. Khan, M; Han, G; Bollepalli, Sb; Cerrina, F; Maldonado, J, Extension Of X-Ray Lithography To 50 Nm With A Harder Spectrum, Journal Of Vacuum Science & Technology B, 3426–3432, 17, 1999
7. Khan, M; Cerrina, F; Toyota, E, Pattern Resolution Of An X-Ray Beamline With A Wide Exposure Field, Journal Of Vacuum Science & Technology B, 3433–3438, 17, 1999
8. Hwu, Y; Tsai, Wl; Lai, B; Mancini, Dc; Je, Jh; Noh, Dy; Youn, Hs; Hwang, Cs; Cerrina, F; Swiech, W; Bertolo, M; Tromba, G; Margaritondo, G, Use Of Photoelectron Microscopes As X-Ray Detectors For Imaging And Other Applications, Nuclear Instruments & Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment, 516–520, 437, 1999
9. Solak, Hh; He, D; Li, W; Singh-Gasson, S; Cerrina, F; Sohn, Bh; Yang, Xm; Nealey, P, Exposure Of 38 Nm Period Grating Patterns With Extreme Ultraviolet Interferometric Lithography, Applied Physics Letters, 2328–2330, 75, 1999
10. Singh-Gasson, S; Green, Rd; Yue, Yj; Nelson, C; Blattner, F; Sussman, Mr; Cerrina, F, Maskless Fabrication Of Light-Directed Oligonucleotide Microarrays Using A Digital Micromirror Array, Nature Biotechnology, 974–978, 17, 1999
11. Yun, W; Lai, B; Krasnoperova, Aa; Di Fabrizio, E; Cai, Z; Cerrina, F; Chen, Z; Gentili, M; Gluskin, E, Development Of Zone Plates With A Blazed Profile For Hard X-Ray Applications, Review Of Scientific Instruments, 3537–3541, 70, 1999
12. Yang, Y; Mishra, S; Cerrina, F; Xu, Sh; Cruguel, H; Lapeyre, Gj; Schetzina, Jf, Photoemission Spectromicroscopy Studies On Epitaxial Lateral Overgrowth Gan Surfaces, Journal Of Vacuum Science & Technology B, 1884–1890, 17, 1999
13. Zacchigna, M; Berger, H; Sirigu, L; Margaritondo, G; Lorusso, Gf; Solak, H; Cerrina, F, A Spectromicroscopy Study Of The Al Gas Interface: Evidence Of Band Bending Lateral Inhomogeneities, Journal Of Electron Spectroscopy And Related Phenomena, 671–675, 103, 1999
14. Solak, Hh; Vladimirsky, Y; Cerrina, F; Lai, B; Yun, W; Cai, Z; Ilinski, P; Legnini, D; Rodrigues, W, Measurement Of Strain In Al-Cu Interconnect Lines With X-Ray Microdiffraction, Journal Of Applied Physics, 884–890, 86, 1999
15. Bollepalli, Sb; Cerrina, F, Computation Of Reflected Images From EUV Masks, Microelectronic Engineering, 443–447, 46, 1999
16. Simon, K; Vladimirsky, O; Vladimirsky, Y; Cerrina, F, Overlay Budget Analysis For The 100 Nm Device Generation, Microelectronic Engineering, 457–460, 46, 1999
17. Yun, W; Lai, B; Cai, Z; Maser, J; Legnini, D; Gluskin, E; Chen, Z; Krasnoperova, Aa; Vladimirsky, Y; Cerrina, F; Di Fabrizio, E; Gentili, M, Nanometer Focusing Of Hard X Rays By Phase Zone Plates, Review Of Scientific Instruments, 2238–2241, 70, 1999
18. Solak, Hh; Lorusso, Gf; Singh-Gasson, S; Cerrina, F, An X-Ray Spectromicroscopic Study Of Electromigration In Patterned AlCu Lines, Applied Physics Letters, 22–24, 74, 1999
19. Bollepalli, Bs; Khan, M; Cerrina, F, Imaging Properties Of The Extreme Ultraviolet Mask, Journal Of Vacuum Science & Technology B, 3444–3448, 16, 1998
20. Singh-Gasson, S; Vladimirsky, Y; Cerrina, F, Aspheric Collimator For A Point Source X-Ray Lithography System, Journal Of Vacuum Science & Technology B, 3456–3461, 16, 1998
21. He, D; Cerrina, F, Process Dependence Of Roughness In A Positive-Tone Chemically Amplified Resist, Journal Of Vacuum Science & Technology B, 3748–3751, 16, 1998
22. De Stasio, G; Gilbert, B; Perfetti, L; Fauchoux, O; Valiquer, A; Nelson, T; Capozi, M; Baudat, Pa; Cerrina, F; Chen, Z; Perfetti, P; Tonner, Bp; Margaritondo, G, Soft-X-Ray Transmission Photoelectron Spectromicroscopy With The MEPHISTO System, Review Of Scientific Instruments, 3106–3108, 69, 1998
23. Hector, S; Pol, V; Khan, M; Bollepalli, S; Cerrina, F, Investigation Of Mask Pattern Proximity Correction To Reduce Image Shortening In X-Ray Lithography, Microelectronic Engineering, 271–274, 42, 1998
24. Shamoun, B; Sprague, M; Bedford, F; Engelstad, R; Cerrina, F, X-Ray Mask Distortions During E-Beam Patterning, Microelectronic Engineering, 283–286, 42, 1998
25. Bollepalli, Bs; Khan, M; Cerrina, F, Automatic Mask Generation In X-Ray Lithography, Journal Of Vacuum Science & Technology B, 2238–2242, 15, 1997
26. Fisher, Ah; Laudon, Mf; Engelstad, Rl; Lovell, Eg; Cerrina, F, Pattern Placement Errors In Mask Membranes, Journal Of Vacuum Science & Technology B, 2249–2254, 15, 1997
27. Khan, M; Bollepalli, S; Cerrina, F, Revisiting Phase Shifting Masks In X-Ray Lithography, Journal Of Vacuum Science & Technology B, 2255–2258, 15, 1997
28. Hector, S; Pol, V; Krasnoperova, A; Maldonado, J; Flamholz, A; Heald, D; Stahlhammer, C; Galburt, D; Amodeo, R; Donohue, T; Wind, S; Buchigniano, J; Viswanathan, R; Khan, M; Bollepalli, S; Cerrina, F, X-Ray Lithography For <= 100 Nm Ground Rules In Complex Patterns, Journal Of Vacuum Science & Technology B, 2517–2521, 15, 1997
29. Chen, Z; Vladimirsky, Y; Brown, M; Leonard, Q; Vladimirsky, O; Moore, F; Cerrina, F; Lai, B; Yun, W; Gluskin, E, Design And Fabrication Of Fresnel Zone Plates With Large Numbers Of Zones, Journal Of Vacuum Science & Technology B, 2522–2527, 15, 1997
30. Ocola, Le; Cerrina, F; May, T, Latent Image Characterization Of Postexposure Bake Process In Chemically Amplified Resists, Journal Of Vacuum Science & Technology B, 2545–2549, 15, 1997
31. Ocola, Le; Cerrina, F; May, T, Synchrotron Radiation Micro-Fourier Transform Infrared Spectroscopy Applied To Photoresist Imaging, Applied Physics Letters, 847–849, 71, 1997
32. Singh, S; Solak, H; Krasnoperov, N; Cerrina, F; Cossy, A; Diaz, J; Stohr, J; Samant, M, An X-Ray Spectromicroscopic Study Of The Local Structure Of Patterned Titanium Silicide, Applied Physics Letters, 55–57, 71, 1997
33. Cerrina, F, Application Of X Rays To Nanolithography, Proceedings Of The Ieee, 644–651, 85, 1997
34. Laudon, M; Fisher, A; Engelstad, R; Cerrina, F; Cummings, K; Dauksher, W; Resnick, D; Johnson, W; Puisto, D, Prediction Of In-Plane Distortions Due To Mask Fabrication Processes, Microelectronic Engineering, 549–552, 35, 1997
35. Dicks, G; Bedford, F; Engelstad, R; Cerrina, F, X-Ray Mask Temperature Distribution And Magnification Control, Microelectronic Engineering, 561–563, 35, 1997
36. Ocola, LE; Fryer, D; Nealey, P; Depablo, J; Cerrina, F; Kammer, S, Latent Image Formation: Nanoscale Topography And Calorimetric Measurements In Chemically Amplified Resists, Journal Of Vacuum Science & Technology B, 3974–3979, 14, 1996
37. Hector, S; Chu, W; Thompson, M; Pol, V; Dauksher, B; Cummings, K; Resnick, D; Pendharkar, S; Maldonado, J; Mccord, M; Krasnoperova, A; Liebmann, L; Silverman, J; Guo, J; Khan, M; Bollepalli, S; Capodieci, L; Cerrina, F, Extendibility Of X-Ray Lithography To <=130 Nm Ground Rules In Complex Integrated Circuit Patterns, Journal Of Vacuum Science & Technology B, 4288–4293, 14, 1996
38. Cerrina, F; Marrian, C, A Path To Nanolithography, Mrs Bulletin, 56–62, 21, 1996
39. Delrio, MS; Cerrina, F, Comments On The Use Of Asymmetric Monochromators For X-Ray Diffraction On A Synchrotron Source - Comment, Review Of Scientific Instruments, 3766–3768, 67, 1996
40. Fanfoni, M; Goletti, C; Chiaradia, P; Ng, W; Cerrina, F; Hwu, Y; Terrasi, A; Margaritondo, G, Schottky Barrier At The Au/Gap110 Interface, Journal Of Vacuum Science & Technology A-Vacuum Surfaces And Films, 2433–2436, 14, 1996
41. Cerrina, F, X-Ray Photo-Electron Spectromicroscopy, Journal Of Electron Spectroscopy And Related Phenomena, 9–19, 76, 1995
42. Ocola, Le; Fryer, Ds; Reynolds, G; Krasnoperova, A; Cerrina, F, Scanning Force Microscopy Measurements Of Latent Image Topography In Chemically Amplified Resists, Applied Physics Letters, 717–719, 68, 1996
43. Capodieci, L; Krasnoperova, A; Cerrina, F; Lyons, C; Spence, C; Early, K, Novel Postexposure Bake Simulator: First Results, Journal Of Vacuum Science & Technology B, 2963–2967, 13, 1995
44. Resnick, Dj; Cummings, Kd; Dauksher, Wj; Johnson, Wa; Seese, Pa; Chen, Hth; Wells, Gm; Engelstad, R; Cerrina, F, The Effect Of Aperturing On Radiation Damage-Induced Pattern Distortion Of X-Ray Masks, Journal Of Vacuum Science & Technology B, 3046–3049, 13, 1995
45. Krasnoperova, AA; Chen, Z; Difabrizio, E; Gentili, M; Cerrina, F, A Novel Technique For High Aspect Ratio High Resolution Patterning Of Membranes, Journal Of Vacuum Science & Technology B, 3061–3065, 13, 1995
46. Wells, Gm; Chen, Hth; Wallace, Jp; Engelstad, Rl; Cerrina, F, Radiation Damage-Induced Changes In Silicon Nitride Membrane Mechanical Properties, Journal Of Vacuum Science & Technology B, 3075–3077, 13, 1995
47. Raychaudhuri, AK; Ng, W; Cerrina, F; Tan, Z; Bjorkholm, J; Tennant, D; Spector, SJ, Alignment Of A Multilayer-Coated Imaging System Using Extreme Ultraviolet Foucault And Ronchi Interferometric Testing, Journal Of Vacuum Science & Technology B, 3089–3093, 13, 1995
48. Wells, Gm; Anderson, Pd; Leonard, Qj; Cerrina, F; Waldo, Wg; Yamazaki, K, Evaluation Of A Solid-State Detector For X-Ray-Lithography Dosimetry, Japanese Journal Of Applied Physics Part 1-Regular Papers Short Notes & Review Papers, 6905–6907, 33, 1994
49. Krasnoperova, Aa; Bell, T; Rhyner, S; Taylor, Jw; Depablo, J; Cerrina, F, Dissolution Study Of A Novolak-Based Photoresist Based On A Developer Diffusion-Model, Japanese Journal Of Applied Physics Part 1-Regular Papers Short Notes & Review Papers, 7012–7016, 33, 1994
50. Gozzo, F; Berger, H; Collins, Ir; Margaritondo, G; Ng, W; Raychaudhuri, Ak; Liang, S; Singh, S; Cerrina, F, Microscopic-Scale Lateral Inhomogeneities Of The Gase-Ge Heterojunction Energy Lineup, Physical Review B, 5024–5027, 51, 1995
51. Tan, Zq; Macdowell, Aa; Lafontaine, B; Bjorkholm, Je; Tennant, D; Taylor, D; Himel, M; Freeman, Rr; Waskiewicz, Wk; Windt, Dl; Spector, S; Raychaudhuri, Ak; Stulen, Rh; Ng, W; Cerrina, F, At-Wavelength Metrology Of 13-Nm Lithography Imaging Optics, Review Of Scientific Instruments, 2241–2243, 66, 1995
52. Welnak, J; Dong, Z; Solak, H; Wallace, J; Cerrina, F; Bertolo, M; Bianco, A; Difonzo, S; Fontana, S; Jark, W; Mazzolini, F; Rosei, R; Savoia, A; Underwood, Jh; Margaritondo, G, Supermaximum - A Schwarzschild-Based, Spectromicroscope For Elettra, Review Of Scientific Instruments, 2273–2276, 66, 1995
53. Lai, B; Yun, W; Xiao, Y; Yang, L; Legnini, D; Cai, Z; Krasnoperova, A; Cerrina, F; Difabrizio, E; Grella, L; Gentili, M, Development Of A Hard X-Ray-Imaging Microscope, Review Of Scientific Instruments, 2287–2289, 66, 1995
54. Krasnoperova, Aa; Khan, M; Rhyner, S; Taylor, Jw; Zhu, Y; Cerrina, F, Modeling And Simulations Of A Positive Chemically Amplified Photoresist For X-Ray-Lithography, Journal Of Vacuum Science & Technology B, 3900–3904, 12, 1994
55. Khan, M; Mohammad, L; Xiao, J; Ocola, L; Cerrina, F, Updated System Model For X-Ray-Lithography, Journal Of Vacuum Science & Technology B, 3930–3935, 12, 1994
56. Gentili, M; Difabrizio, E; Grella, L; Baciocchi, M; Mastrogiacomo, L; Maggiora, R; Xiao, J; Cerrina, F, Fabrication Of Controlled Slope Attenuated Phase-Shift X-Ray Masks For 250 Nm Synchrotron Lithography, Journal Of Vacuum Science & Technology B, 3954–3958, 12, 1994
57. Chen, Hth; Engelstad, Rl; Cerrina, F, Novel Technique For The Separation Of Mechanical-Properties And Intrinsic Stress Of Pre-Irradiated And Post-Irradiated Membranes, Journal Of Vacuum Science & Technology B, 3975–3978, 12, 1994
58. Difabrizio, E; Gentili, M; Grella, L; Baciocchi, M; Krasnoperova, A; Cerrina, F; Yun, W; Lai, B; Gluskin, E, High-Performance Multilevel Blazed X-Ray Microscopy Fresnel Zone Plates - Fabricated Using X-Ray-Lithography, Journal Of Vacuum Science & Technology B, 3979–3985, 12, 1994
59. Ocola, Le; Cerrina, F, Parametric Modeling At Resist-Substrate Interfaces, Journal Of Vacuum Science & Technology B, 3986–3989, 12, 1994
60. Shoki, T; Ohkubo, R; Kosuga, H; Yamaguchi, Y; Annaka, N; Wells, Gm; Yamazaki, K; Cerrina, F, Accelerated Radiation-Damage Studies Of Antireflection Materials On Sic X-Ray Mask Membrane, Journal Of Vacuum Science & Technology B, 3995–4000, 12, 1994
61. Chen, G; Yamazaki, K; Waldo, W; Welnak, J; Wells, Gm; Cerrina, F, Synchrotron-Radiation X-Ray-Lithography Beamline Optics Alignment Using The Hartmann Method, Journal Of Vacuum Science & Technology B, 4013–4017, 12, 1994
62. Xiao, Jb; Cerrina, F; Rippstein, Rp, Novel Single Mirror Condenser For X-Ray-Lithography Beam Lines, Journal Of Vacuum Science & Technology B, 4018–4023, 12, 1994
63. Xiao, Jb; Khan, M; Nachman, R; Wallace, J; Chen, Z; Cerrina, F, Modeling Image-Formation - Application To Mask Optimization, Journal Of Vacuum Science & Technology B, 4038–4043, 12, 1994
64. Pan, Sw; Reilly, Mt; Difabrizio, E; Leonard, Q; Taylor, Jw; Cerrina, F, An Optimization Design Method For Chemically Amplified Resist Process-Control, Ieee Transactions On Semiconductor Manufacturing, 325–332, 7, 1994
65. Xiao, Jb; Cerrina, F, Design Of Aspheric Mirror For Synchrotron-Radiation X-Ray-Lithography Beamline, Nuclear Instruments & Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment, 231–237, 347, 1994
66. Chen, Gj; Guo, Jzy; Cerrina, F, Applications Of Faceted Mirrors To X-Ray-Lithography Beamlines, Nuclear Instruments & Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment, 238–243, 347, 1994
67. Delrio, Ms; Ferrero, C; Chen, Gj; Cerrina, F, Modeling Perfect Crystals In Transmission Geometry For Synchrotron-Radiation Monochromator Design, Nuclear Instruments & Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment, 338–343, 347, 1994
68. Welnak, C; Chen, Gj; Cerrina, F, Shadow - A Synchrotron-Radiation And X-Ray Optics Simulation Tool, Nuclear Instruments & Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment, 344–347, 347, 1994
69. Raychaudhuri, Ak; Ng, W; Liang, S; Cerrina, F, Soft-X-Ray Foucault Test - A Path To Diffraction-Limited Imaging, Nuclear Instruments & Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment, 364–371, 347, 1994
70. Welnak, J; Raychaudhuri, Ak; Ng, W; Cerrina, F, Double-Moment Kirkpatrick-Baez Condensing Mirrors - In-Situ Alignment, Nuclear Instruments & Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment, 372–375, 347, 1994
71. Chen, Gj; Cerrina, F; Voss, Kf; Kim, Kh; Brown, Fc, Ray-Tracing Of X-Ray Focusing Capillaries, Nuclear Instruments & Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment, 407–411, 347, 1994
72. Ng, W; Raychaudhuri, Ak; Liang, S; Singh, S; Solak, H; Welnak, J; Cerrina, F; Margaritondo, G; Underwood, Jh; Kortright, Jb; Perera, Rcc, High-Resolution Spectromicroscopy With Maximum - Photoemission Spectroscopy Reaches The 1000-Angstrom Scale, Nuclear Instruments & Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment, 422–430, 347, 1994
73. Wells, Gm; Brodsky, El; Reilly, M; Taylor, Jw; Cerrina, F, The Center For X-Ray-Lithography Facility Status And Beamlines Development, Nuclear Instruments & Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment, 466–471, 347, 1994
74. Gozzo, F; Marsi, M; Berger, H; Margaritondo, G; Ottolenghi, A; Raychaudhuri, Ak; Ng, W; Liang, S; Singh, S; Welnak, Jt; Wallace, Jp; Capasso, C; Cerrina, F, Microscopic-Scale Lateral Inhomogeneities Of The Schottky-Barrier Formation Process Vol B48, Pg 17163, 1993, Physical Review B, 14085–14085, 49, 1994
75. Raychaudhuri, Ak; Cerrina, F, Status Of Soft-X-Ray Photoemission Microscopy Utilizing Synchrotron-Radiation, Nuclear Instruments & Methods In Physics Research Section B-Beam Interactions With Materials And Atoms, 104–111, 87, 1994
76. Moses, Ww; Derenzo, Se; Weber, Mj; Raychaudhuri, Ak; Cerrina, F, Scintillation Mechanisms In Cerium Fluoride, Journal Of Luminescence, 89–100, 59, 1994
77. Laudon, Mf; Laird, Dl; Engelstad, Rl; Cerrina, F, Mechanical Response Of X-Ray Masks, Japanese Journal Of Applied Physics Part 1-Regular Papers Short Notes & Review Papers, 5928–5932, 32, 1993
78. Chen, G; Wallace, Jp; Cerrina, F, Linear-Fresnel-Zone-Plate-Based 2-State Alignment Method For Sub-0.25 Mu-M X-Ray-Lithography System, Japanese Journal Of Applied Physics Part 1-Regular Papers Short Notes & Review Papers, 5977–5981, 32, 1993
79. Cerrina, F, Papers From The 37th International-Symposium On Electron, Ion, And Photon Beams - 1-4 June 1993 Sheraton-Harbor-Island-Hotel San-Diego, California - Preface, Journal Of Vacuum Science & Technology B, 2152–2152, 11, 1993
80. Turner, S; Cerrina, F, Optimization Of Aerial Image Quality, Journal Of Vacuum Science & Technology B, 2446–2451, 11, 1993
81. Difabrizio, E; Grella, L; Luciani, L; Gentili, M; Baciocchi, M; Figliomeni, M; Mastrogiacomo, L; Maggiora, R; Leonard, Q; Cerrina, F; Molino, M; Powderly, D, Metrology Of High-Resolution Resist Structures On Insulating Substrates, Journal Of Vacuum Science & Technology B, 2456–2462, 11, 1993
82. Krasnoperova, Aa; Xiao, J; Cerrina, F; Difabrizio, E; Luciani, L; Figliomeni, M; Gentili, M, Fabrication Of Hard X-Ray Phase Zone-Plate By X-Ray-Lithography, Journal Of Vacuum Science & Technology B, 2588–2591, 11, 1993
83. Krasnoperova, Aa; Turner, Sw; Ocola, L; Cerrina, F, Effect Of Low-Solubility Surface-Layer On Development Of Az-Pf514, Journal Of Vacuum Science & Technology B, 2829–2833, 11, 1993
84. Guo, Jzy; Leonard, Q; Cerrina, F; Difabrizio, E; Luciani, L; Gentili, M; Frank, J, Experimental-Study Of Aerial Images In X-Ray-Lithography, Journal Of Vacuum Science & Technology B, 2902–2905, 11, 1993
85. Gentili, M; Grella, L; Difabrizio, E; Luciani, L; Baciocchi, M; Figliomeni, M; Maggiora, R; Mastrogiacomo, L; Cerrina, F, Development Of An Electron-Beam Process For The Fabrication Of X-Ray Nanomasks, Journal Of Vacuum Science & Technology B, 2938–2942, 11, 1993
86. Reilly, M; Wells, Gm; Guo, J; Wallace, Jp; Edwards, N; Cerrina, F; Melngailis, J, X-Ray Mask Replication Using Square Synchrotron-Radiation Illumination, Journal Of Vacuum Science & Technology B, 2971–2975, 11, 1993
87. Wells, Gm; Brodsky, El; Cerrina, F; Waldo, Wg, Evaluation Of Beryllium Foils For X-Ray-Lithography Beamlines, Journal Of Vacuum Science & Technology B, 3008–3011, 11, 1993
88. Pan, Sw; Reilly, Mt; Taylor, Jw; Cerrina, F, Optimization Design Program For Chemically Amplified Resist Process, Journal Of Vacuum Science & Technology B, 2845–2849, 11, 1993
89. Ocola, Le; Cerrina, F, Parametric Modeling Of Photoelectron Effects In X-Ray-Lithography, Journal Of Vacuum Science & Technology B, 2839–2844, 11, 1993
90. Gozzo, F; Marsi, M; Berger, H; Margaritondo, G; Ottolenghi, A; Raychaudhuri, Ak; Ng, W; Liang, S; Singh, S; Welnak, Jt; Wallace, Jp; Capasso, C; Cerrina, F, Microscopic-Scale Lateral Inhomogeneities Of The Schottky-Barrier-Formation Process, Physical Review B, 17163–17167, 48, 1993
91. Calvert, Jm; Koloski, Ts; Dressick, Wj; Dulcey, Cs; Peckerar, Mc; Cerrina, F; Taylor, Jw; Suh, Dw; Wood, Or; Macdowell, Aa; Dsouza, R, Projection X-Ray-Lithography With Ultrathin Imaging Layers And Selective Electroless Metallization, Optical Engineering, 2437–2445, 32, 1993
92. Campbell, Sa; Lee, Kh; Li, Hh; Nachman, R; Cerrina, F, Charge Trapping And Device Degradation Induced By X-Ray-Irradiation In Metal-Oxide-Semiconductor Field-Effect Transistors, Applied Physics Letters, 1646–1647, 63, 1993
93. Destasio, G; Perfetti, P; Ng, W; Raychaudhuri, Ak; Liang, Sh; Singh, S; Cole, Rk; Guo, Zy; Wallace, J; Capasso, C; Cerrina, F; Mercanti, D; Ciotti, Mt; Gozzo, F; Margaritondo, G, Scanning Photoemission Spectromicroscopy Of Neurons, Physical Review E, 1478–1482, 48, 1993
94. Guo, Jzy; Cerrina, F, Modeling X-Ray Proximity Lithography, Ibm Journal Of Research And Development, 331–349, 37, 1993
95. Raychaudhuri, Ak; Ng, W; Liang, S; Singh, S; Welnak, Jt; Wallace, Jp; Capasso, C; Cerrina, F; Margaritondo, G; Underwood, Jh; Kortright, Jb; Perera, Rcc, 1st Results Of Microspectroscopy From A Scanning Photoemission Microscope With A Submicron Probe Size, Journal Of Vacuum Science & Technology A-Vacuum Surfaces And Films, 2324–2329, 11, 1993
96. Cerrina, F; Raychaudhuri, Ak; Ng, W; Liang, S; Singh, S; Welnak, Jt; Wallace, Jp; Capasso, C; Underwood, Jh; Kortright, Jb; Perera, Rcc; Margaritondo, G, Microscopic-Scale Lateral Inhomogeneities Of The Photoemission Response Of Cleaved Gaas, Applied Physics Letters, 63–65, 63, 1993
97. Capasso, C; Ng, W; Raychaudhuri, Ak; Liang, Sh; Cole, Rk; Guo, Zy; Wallace, J; Cerrina, F; Underwood, J; Perera, R; Kortright, J; Destasio, G; Margaritondo, G, Scanning Photoemission Microscopy On Maximum Reaches 0.1 Micron Resolution, Surface Science, 1046–1050, 287, 1993
98. White, V; Bajikar, S; Denton, D; Cerrina, F; Lai, B; Yun, Wb; Legnini, D; Xiao, Y; Chrzas, J; Difabrizio, E; Grella, L; Baciocchi, M, Microfabrication Of Phase-Shifting Zone Plates For Hard X-Rays, Microelectronic Engineering, 99–102, 21, 1993
99. Cerrina, F; Baszler, F; Turner, S; Khan, M, Transmit - A Beamline Modeling Program, Microelectronic Engineering, 103–106, 21, 1993
100. Hansen, Me; Chen, Hth; Chen, G; Engelstad, Rl; Cerrina, F, Novel X-Ray Mask Distortion Measurement Technique Employing Holographic Gratings And Phase-Shifting Interferometry, Journal Of Vacuum Science & Technology B, 2657–2661, 10, 1992
101. White, V; Cerrina, F, Metalless X-Ray Phase-Shift Masks For Nanolithography, Journal Of Vacuum Science & Technology B, 3141–3144, 10, 1992
102. Guo, Jzy; Leonard, Q; Cerrina, F; Difabrizio, E; Luciani, L; Gentili, M; Gerold, D, Experimental And Theoretical-Study Of Image Bias In X-Ray-Lithography, Journal Of Vacuum Science & Technology B, 3150–3154, 10, 1992
103. Wells, Gm; Krasnoperova, A; Haytcher, Ea; Engelstad, R; Cerrina, F; Fair, R; Maldonado, J, Novel-Approach To Zero-Magnification X-Ray Mask Replication, Journal Of Vacuum Science & Technology B, 3221–3223, 10, 1992
104. Chen, G; Wallace, J; Nachman, R; Wells, G; Bodoh, D; Anderson, P; Reilly, M; Cerrina, F, Cxrl Aligner - An Experimental X-Ray-Lithography System For Quarter-Micron Feature Devices, Journal Of Vacuum Science & Technology B, 3229–3234, 10, 1992
105. Wells, Gm; Taylor, Jw; Cerrina, F; Pearson, D; Mackay, J, Measurement Of X-Ray Absorption-Spectra Of Photoresists Using A Silicon Lithium Detector, Journal Of Vacuum Science & Technology B, 3252–3255, 10, 1992
106. Cerrina, F, Recent Advances In X-Ray-Lithography, Japanese Journal Of Applied Physics Part 1-Regular Papers Short Notes & Review Papers, 4178–4184, 31, 1992
107. Lai, B; Yun, Wb; Legnini, D; Xiao, Y; Chrzas, J; Viccaro, Pj; White, V; Bajikar, S; Denton, D; Cerrina, F; Difabrizio, E; Gentili, M; Grella, L; Baciocchi, M, Hard X-Ray Phase Zone Plate Fabricated By Lithographic Techniques, Applied Physics Letters, 1877–1879, 61, 1992
108. Lee, Kh; Campbell, Sa; Nachman, R; Reilly, M; Cerrina, F, X-Ray-Damage In Low-Temperature Ultrathin Silicon Dioxide, Applied Physics Letters, 1635–1637, 61, 1992
109. Wallace, J; Chen, G; Reilly, M; Anderson, P; Cerrina, F, A Novel Aligner For X-Ray-Lithography, Nuclear Instruments & Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment, 371–375, 319, 1992
110. Chen, G; Seshadri, Sr; Cerrina, F, Distributed Feedback Lasers With Distributed Phase-Shift Structure, Applied Physics Letters, 2586–2588, 60, 1992
111. Cerrina, F; Guo, Jzy; Turner, S; Ocola, L; Khan, M; Anderson, P, Image-Formation In X-Ray-Lithography - Process Optimization, Microelectronic Engineering, 135–140, 17, 1992
112. Laird, Dl; Lenius, Pe; Engelstad, Rl; Cerrina, F, Analysis And Optimization Of X-Ray Masks Using Finite-Element Methods, Microelectronic Engineering, 209–213, 17, 1992
113. Prewett, Pd; Gentili, M; Maggiora, R; Mastrogiacomo, L; Watson, Jg; Turner, Gs; Brown, Gw; Plumb, D; Leonard, Q; Cerrina, F, Fib Repair Of Clear And Opaque Defects In X-Ray Masks, Microelectronic Engineering, 249–253, 17, 1992
114. Gentili, M; Grella, L; Baciocchi, M; Kumar, R; Meneghini, G; Plumb, D; Leonard, Q; Cerrina, F, Fabrication Of Dfb Laser Gratings Using Synchrotron Radiation Proximity Lithography, Microelectronic Engineering, 551–554, 17, 1992
115. Delrio, Ms; Bernstorff, S; Savoia, A; Cerrina, F, A Conceptual-Model For Ray Tracing Calculations With Mosaic Crystals, Review Of Scientific Instruments, 932–935, 63, 1992
116. Delrio, Ms; Cerrina, F, Asymmetrically Cut Crystals For Synchrotron Radiation Monochromators, Review Of Scientific Instruments, 936–940, 63, 1992
117. Brodsky, El; Hamilton, W; Wells, G; Cerrina, F; Corradini, M, Beryllium Window And Acoustic Delay-Line Design For X-Ray-Lithography Beam Lines At The University-Of-Wisconsin Center For X-Ray-Lithography, Review Of Scientific Instruments, 749–752, 63, 1992
118. Welnak, C; Anderson, P; Khan, M; Singh, S; Cerrina, F, Recent Developments In Shadow, Review Of Scientific Instruments, 865–868, 63, 1992
119. Guo, Jzy; Cerrina, F, Verification Of Partially Coherent-Light Diffraction Models In X-Ray-Lithography, Journal Of Vacuum Science & Technology B, 3207–3213, 9, 1991
120. Chen, G; Wallace, J; Cerrina, F; Palmer, S; Newell, B; Randall, J, Experimental Evaluation Of The 2-State Alignment System, Journal Of Vacuum Science & Technology B, 3222–3226, 9, 1991
121. Wells, Gm; Nachman, R; Welnak, C; Singh, S; Guo, J; Khan, M; Turner, S; Cerrina, F; Vladimirsky, Y; Maldonado, J, Effects Of Mirror Surface-Roughness On Exposure Field Uniformity In Synchrotron X-Ray-Lithography, Journal Of Vacuum Science & Technology B, 3227–3231, 9, 1991
122. Boily, S; Chaker, M; Pepin, H; Kerdja, T; Voyer, J; Jean, A; Kieffer, Jc; Leung, P; Cerrina, F; Wells, G, Sic Membranes For X-Ray Masks Produced By Laser Ablation Deposition, Journal Of Vacuum Science & Technology B, 3254–3257, 9, 1991
123. Shimkunas, Ar; Mauger, Pe; Bourget, Lp; Post, Rs; Smith, L; Davis, Rf; Wells, Gm; Cerrina, F; Mcintosh, Rb, Advanced Electron-Cyclotron Resonance Chemical Vapor-Deposition Sic Coatings And X-Ray Mask Membranes, Journal Of Vacuum Science & Technology B, 3258–3261, 9, 1991
124. White, V; Ocola, L; Cerrina, F; Vladimirsky, Y; Maldonado, J, Photoelectron Effects In X-Ray Mask Replication, Journal Of Vacuum Science & Technology B, 3270–3274, 9, 1991
125. Turner, S; Babcock, C; Cerrina, F, Modeling Of Shot Noise In X-Ray Photoresist Exposure, Journal Of Vacuum Science & Technology B, 3440–3446, 9, 1991
126. Destasio, G; Capasso, C; Ng, W; Raychaudhuri, Ak; Liang, Sh; Cole, Rk; Guo, Zy; Wallace, J; Cerrina, F; Margaritondo, G; Underwood, J; Perera, R; Kortright, J; Mercanti, D; Ciotti, Mt; Stecchi, A, High-Resolution Photoelectron Microimaging Of Neuron Networks, Europhysics Letters, 411–414, 16, 1991
127. Cole, Rk; Cerrina, F, Novel Beamline Optics For X-Ray-Lithography, Microelectronic Engineering, 295–298, 13, 1991
128. Capasso, C; Raychaudhuri, Ak; Ng, W; Liang, S; Cole, Rk; Wallace, J; Cerrina, F; Margaritondo, G; Underwood, Jh; Kortright, Jb; Perera, Rcc, High-Resolution X-Ray Microscopy Using An Undulator Source, Photoelectron Studies With Maximum, Journal Of Vacuum Science & Technology A-Vacuum Surfaces And Films, 1248–1253, 9, 1991
129. Mercanti, D; Destasio, G; Ciotti, Mt; Capasso, C; Ng, W; Raychaudhuri, Ak; Liang, Sh; Cole, Rk; Guo, Zy; Wallace, J; Margaritondo, G; Cerrina, F; Underwood, J; Perera, R; Kortright, J, Photoelectron Microscopy In The Life Sciences - Imaging Neuron Networks, Journal Of Vacuum Science & Technology A-Vacuum Surfaces And Films, 1320–1322, 9, 1991
130. Wells, Cmm; Pearson, Dw; Deluca, Pm; Wells, Gm; Cerrina, F; Kennan, Ws; Gould, Mn, Synchrotron-Produced Ultrasoft X-Rays - A Tool For Testing Biophysical Models Of Radiation Action, International Journal Of Radiation Biology, 985–996, 59, 1991
131. Delrio, Ms; Cerrina, F, Bent - Software For Ray-Tracing Of X-Rays On Bent Oblique-Cut Crystals - A Comment, Nuclear Instruments & Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment, 589–590, 301, 1991
132. Baszler, F; Hansen, M; Cerrina, F, Absolute Flux Measurements For X-Ray-Lithography Beamlines, Journal Of Vacuum Science & Technology B, 1529–1534, 8, 1990
133. Guo, Jzy; Chen, G; White, V; Anderson, P; Cerrina, F, Aerial Image-Formation In Synchrotron-Radiation-Based X-Ray-Lithography - The Whole Picture, Journal Of Vacuum Science & Technology B, 1551–1556, 8, 1990
134. Lenius, P; Engelstad, R; Palmer, S; Brodsky, E; Cerrina, F, Mechanical Distortions Of Support Frames For X-Ray-Lithography Masks, Journal Of Vacuum Science & Technology B, 1570–1574, 8, 1990
135. Wells, Gm; Palmer, S; Cerrina, F; Purdes, A; Gnade, B, Radiation Stability Of Sic And Diamond Membranes As Potential X-Ray-Lithography Mask Carriers, Journal Of Vacuum Science & Technology B, 1575–1578, 8, 1990
136. White, V; Wallace, J; Cerrina, F; Vladimirski, Y; Su, Y; Maldonado, J, Contrast Amplification Of Very High-Resolution X-Ray Masks, Journal Of Vacuum Science & Technology B, 1595–1599, 8, 1990
137. Chen, G; Wallace, J; Palmer, S; Cerrina, F; Randall, J, The Effect Of Process Coatings On The Alignment Signal In A Proximity Lithography System, Journal Of Vacuum Science & Technology B, 2012–2016, 8, 1990
138. Destasio, G; Ng, W; Raychaudhuri, Ak; Cole, Rk; Guo, Zy; Wallace, J; Margaritondo, G; Cerrina, F; Underwood, J; Perera, R; Kortright, J; Mercanti, D; Ciotti, Mt, Scanning Photoelectron Microscopy With Undulator Radiation - A Successful Test On Uncoated Neurons, Nuclear Instruments & Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment, 351–354, 294, 1990
139. Ng, W; Raychaudhuri, Ak; Cole, Rk; Wallace, J; Crossley, S; Crossley, D; Chen, G; Green, M; Guo, J; Hansen, Rwc; Cerrina, F; Margaritondo, G, Photoemission Spectromicroscopy With Maximum At Wisconsin, Physica Scripta, 758–760, 41, 1990
140. Margaritondo, G; Cerrina, F, Overview Of Soft-X-Ray Photoemission Spectromicroscopy, Nuclear Instruments & Methods In Physics Research Section A-Accelerators Spectrometers Detectors And Associated Equipment, 26–35, 291, 1990
141. Blackwell, Rj; Baker, Jw; Wells, Gm; Hansen, M; Wallace, J; Cerrina, F, Synchrotron Radiation X-Ray-Lithography Fabrication Of 0.35 Mu-M Gate-Length N-Type Metal-Oxide-Semiconductor Transistors, Journal Of Vacuum Science & Technology B, 439–445, 8, 1990
142. Ng, W; Raychaudhuri, Ak; Crossley, S; Crossley, D; Gong, C; Guo, J; Hansen, R; Margaritondo, G; Cerrina, F; Underwood, J; Perera, R; Kortright, J, The Photoemission Spectromicroscope Multiple-Application X-Ray-Imaging Undulator Microscope Maximum, Journal Of Vacuum Science & Technology A-Vacuum Surfaces And Films, 2563–2565, 8, 1990

top