CNTech Publications List

2000 - 2005 | 1990 - 1999 | 1980 - 1989 | 1970 - 1979

1. Junarsa, I; Stoykovich, Mp; Nealey, Pf; Ma, Ys; Cerrina, F, Hydrogen Silsesquioxane As A High Resolution Negative-Tone Resist For Extreme Ultraviolet Lithography, Journal Of Vacuum Science & Technology B, 138–143, 23, 2005
2. Kim, C; Li, M; Rodesch, M; Lowe, A; Richmond, K; Cerrina, F, Biological Lithography: Improvements In DNA Synthesis Methods, Journal Of Vacuum Science & Technology B, 3163–3167, 22, 2004
3. Amy, D; Jiang, L; Zheng, R; Feldman, M; Cerrina, F; Dhuey, S; Leonard, Q; Thielman, D, Minimal Zone Plates For X-Ray Lithography, Journal Of Vacuum Science & Technology B, 3570–3574, 22, 2004
4. Malueg, Dh; Taylor, Jw; Thielman, D; Leonard, Q; Dhuey, S; Cerrina, F, Modeling, Fabrication, And Experimental Application Of Clear X-Ray Phase Masks, Journal Of Vacuum Science & Technology B, 3575–3580, 22, 2004
5. Shaginian, A; Patel, M; Li, Mh; Flickinger, St; Kim, Ch; Cerrina, F; Belshaw, Pj, Light-Directed Radial Combinatorial Chemistry: Orthogonal Safety-Catch Protecting Groups For The Synthesis Of Small Molecule Microarrays, Journal Of The American Chemical Society, 16704–16705, 126, 2004
6. Gonsalves, Ke; Thiyagarajan, M; Choi, Jh; Zimmerman, P; Cerrina, F; Nealey, P; Golovkina, V; Wallace, J; Batina, N, High Performance Resist For EUV Lithography, Microelectronic Engineering, 27–35, 77, 2005
7. Richmond, Ke; Li, Mh; Rodesch, Mj; Patel, M; Lowe, Am; Kim, C; Chu, Ll; Venkataramaian, N; Flickinger, Sf; Kaysen, J; Belshaw, Pj; Sussman, Mr; Cerrina, F, Amplification And Assembly Of Chip-Eluted DNA AACED: A Method For High-Throughput Gene Synthesis, Nucleic Acids Research, 5011–5018, 32, 2004
8. Malueg, Dh; Khan, M; Cerrina, F; Taylor, Jw, Modeling Clear Phase-Mask Materials For Sub-50 Nm X-Ray Application, Japanese Journal Of Applied Physics Part 1-Regular Papers Short Notes & Review Papers, 3722–3727, 43, 2004
9. Knaack, Sa; Eddington, J; Leonard, Q; Cerrina, F; Onellion, M, Dense Arrays Of Nanopores As X-Ray Lithography Masks, Applied Physics Letters, 3388–3390, 84, 2004
10. Golovkina, Vn; Nealey, Pf; Cerrina, F; Taylor, Jw; Solak, Hh; David, C; Gobrecht, J, Exploring The Ultimate Resolution Of Positive-Tone Chemically Amplified Resists: 26 Nm Dense Lines Using Extreme Ultraviolet Interference Lithography, Journal Of Vacuum Science & Technology B, 99–103, 22, 2004
11. Kim, C; Li, M; Lowe, A; Venkataramaiah, N; Richmond, K; Kaysen, J; Cerrina, F, DNA Microarrays: An Imaging Study, Journal Of Vacuum Science & Technology B, 2946–2950, 21, 2003
12. Ma, Ys; Tsvid, G; Cerrina, F, Line Edge Roughness Of Sub-100 Nm Dense And Isolated Features: Experimental Study, Journal Of Vacuum Science & Technology B, 3124–3130, 21, 2003
13. Han, G; Khan, M; Cerrina, F, Stochastic Modeling Of High Energy Lithographies, Journal Of Vacuum Science & Technology B, 3166–3171, 21, 2003
14. Solak, Hh; David, C; Gobrecht, J; Golovkina, V; Cerrina, F; Kim, So; Nealey, Pf, Sub-50 Nm Period Patterns With EUV Interference Lithography, Microelectronic Engineering, 56–62, 67-8, 2003
15. Ali, Ma; Gonsalves, Ke; Golovkina, V; Cerrina, F, High Sensitivity Nanocomposite Resists For EUV Lithography, Microelectronic Engineering, 454–462, 65, 2003
16. Ma, Ys; Shin, J; Cerrina, F, Line Edge Roughness And Photoresist Percolation Development Model, Journal Of Vacuum Science & Technology B, 112–117, 21, 2003
17. Alianelli, L; Del Rio, MS; Khan, M; Cerrina, F, A Comment On 'A New Ray-Tracing Program RIGTRACE For X-Ray Optical Systems' [J. Synchrotron Rad. 2001, 8, 1047-1050], Journal Of Synchrotron Radiation, 191–192, 10, 2003
18. Han, G; Khan, M; Fang, Yh; Cerrina, F, Comprehensive Model Of Electron Energy Deposition, Journal Of Vacuum Science & Technology B, 2666–2671, 20, 2002
19. Solak, Hh; David, C; Gobrecht, J; Wang, L; Cerrina, F, Multiple-Beam Interference Lithography With Electron Beam Written Gratings, Journal Of Vacuum Science & Technology B, 2844–2848, 20, 2002
20. Shin, J; Ma, Y; Cerrina, F, Depth Dependence Of Resist Line-Edge Roughness: Relation To Photoacid Diffusion Length, Journal Of Vacuum Science & Technology B, 2927–2931, 20, 2002
21. Nuwaysir, EF; Huang, W; Albert, TJ; Singh, J; Nuwaysir, K; Pitas, A; Richmond, T; Gorski, T; Berg, JP; Ballin, J; Mccormick, M; Norton, J; Pollock, T; Sumwalt, T; Butcher, L; Porter, D; Molla, M; Hall, C; Blattner, F; Sussman, MR; Wallace, RL; Cerrina, F; Green, RD, Gene Expression Analysis Using Oligonucleotide Arrays Produced By Maskless Photolithography, Genome Research, 1749–1755, 12, 2002
22. Cerrina, F; Blattner, F; Huang, W; Hue, Y; Green, R; Singh-Gasson, S; Sussman, M, Biological Lithography: Development Of A Maskless Microarray Synthesizer For DNA Chips, Microelectronic Engineering, 33–40, 61-2, 2002
23. Solak, Hh; David, C; Gobrecht, J; Wang, L; Cerrina, F, Four-Wave EUV Interference Lithography, Microelectronic Engineering, 77–82, 61-2, 2002
24. Yang, L; Cerrina, F; Taylor, Jw, Bright Peak Enhanced X-Ray Clear Phase Mask, Journal Of Vacuum Science & Technology B, 250–256, 20, 2002
25. Solak, Hh; Yang, Y; Cerrina, F, Observation Of Speckle Patterns In Extreme Ultraviolet Imaging, Journal Of Vacuum Science & Technology B, 2406–2411, 19, 2001
26. Khan, M; Han, G; Tsvid, G; Kitayama, T; Maldonado, J; Cerrina, F, Can Proximity X-Ray Lithography Print 35 Nm Features? Yes, Journal Of Vacuum Science & Technology B, 2423–2427, 19, 2001
27. Toyota, E; Hori, T; Khan, M; Cerrina, F, Technique For 25 Nm X-Ray Nanolithography, Journal Of Vacuum Science & Technology B, 2428–2433, 19, 2001
28. Feldman, M; Khan, M; Cerrina, F, Focusing X-Ray Masks For Printing Very Narrow Features, Journal Of Vacuum Science & Technology B, 2434–2438, 19, 2001
29. Shin, J; Han, G; Ma, Y; Moloni, K; Cerrina, F, Resist Line Edge Roughness And Aerial Image Contrast, Journal Of Vacuum Science & Technology B, 2890–2895, 19, 2001
30. Lee, Kk; Lim, Dr; Kimerling, Lc; Shin, J; Cerrina, F, Fabrication Of Ultralow-Loss Si/Sio2 Waveguides By Roughness Reduction, Optics Letters, 1888–1890, 26, 2001
31. Krysan, Pj; Green, R; Cerrina, F; Sussman, Mr, A Knockout For Every Gene And A Chip For Every Purpose., Faseb Journal, A1157–A1157, 15, 2001
32. Yi, Ss; Moran, Pd; Zhang, X; Cerrina, F; Carter, J; Smith, Hi; Kuech, Tf, Oriented Crystallization Of Gasb On A Patterned, Amorphous Si Substrate, Applied Physics Letters, 1358–1360, 78, 2001
33. Kim, Y; Shapiro, Na; Feick, H; Armitage, R; Weber, Er; Yang, Y; Cerrina, F, Elastic Strain Relief In Nitridated Ga Metal Buffer Layers For Epitaxial Gan Growth, Applied Physics Letters, 895–897, 78, 2001
34. Yang, Xm; Peters, Rd; Nealey, Pf; Solak, Hh; Cerrina, F, Guided Self-Assembly Of Symmetric Diblock Copolymer Films On Chemically Nanopatterned Substrates, Macromolecules, 9575–9582, 33, 2000
35. Han, G; Cerrina, F, Energy Transfer Between Electrons And Photoresist: Its Relation To Resolution, Journal Of Vacuum Science & Technology B, 3297–3302, 18, 2000
36. Cerrina, F; Bollepalli, S; Khan, M; Solak, H; Li, W; He, D, Image Formation In EUV Lithography: Multilayer And Resist Properties, Microelectronic Engineering, 13–20, 53, 2000
37. Cerrina, F, X-Ray Imaging: Applications To Patterning And Lithography, Journal Of Physics D-Applied Physics, R103–R116, 33, 2000
38. Zhang, X; Solak, H; Cerrina, F; Lai, B; Cai, Z; Ilinski, P; Legnini, D; Rodrigues, W, X-Ray Microdiffraction Study Of Cu Interconnects, Applied Physics Letters, 315–317, 76, 2000

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