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Electron Beam Lithography
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The electron beam microfabricator provides an exposure
method for various research initiatives at the Center
for NanoTechnology. It allows direct write of patterns
in photoresist on silicon wafers for the purposes of
testing resist sensitivity and characteristics or pattern
generation for other purposes. It also provides a medium
for patterning of optical and X-ray masks. In addition
to providing unaffiliated users with access to an advanced
lithography tool, the e-beam provides students with
experience in advanced lithography tools. |
JEOL
JBX-5D2-U E-Beam Lithography System Specifications
Recent patterns written in
UV3 by the JEOL JBX-5D2-U E-Beam Lithography
System
click on the image to see a larger version. |
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Useful
Files for Current Users
In order to schedule time to use the e-beam you will need to register
on MeetingMaker. If
you are a new user you must contact Scott
Dhuey for training and
to obtain the password for MeetingMaker.
For more information on the e-beam, please contact: Scott
Dhuey at
the Center for Nanotechnology
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