Center for NanoTechnology (CNTech), University of Wisconsin

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FACILITIES

Capabilities

X-ray and EUV beamline design and fabrication	Contact John Wallace
Mask and lithography modelling	Contact Dan Malueg
Mask fabrication
X-ray absorber masks X-ray phase masks Cr UV masks see also Masks_&_Metrology.pdf	Contact Quinn Leonard Contact Quinn Leonard Contact Scott Dhuey
Lithographic Patterning
E-beam X-ray see also X-Ray Lithography.pdf EUV UV see also Lithography_and_Metrology.ppt	Contact Scott Dhuey Contact Quinn Leonard, Dan Malueg, or John Wallace Contact Dan Malueg, or John Wallace Contact Quinn Leonard
Pattern transfer
Dry etch Wet etch Nanoimprinting
Deposition
Evaporation and sputtering Wet electroplating
Metrology
Film thickness measurement Dissolution rate measurement Optical microscopy Interferometry SEM imaging Atomic force microscopy See also Lithography_and_Metrology.ppt

last updated: August 26, 2005

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