EUV Interferometry

• Investigation of Sub 50 nm Patterned Polymer Brushes for Lithographic Applications [PDF]
  Erik W. Edwards, Tushar S. Jain, Mark P. Stoykovich, Juan J. de Pablo and Paul F. Nealey
  University of Wisconsin-Madison
  Department of Chemical and Biological Engineering and Center for NanoTechnology
   
• EUV EXPERIMENTAL RESEARCH [PDF poster]
   
• Methods of Reducing the Collapse of Photoresist Nanostructures [PDF poster]
  Mark P. Stoykovich, Ivan Junarsa, Paul F. Nealey
  Department of Chemical and Biological Engineering and Center for Nanotechnology, University of Wisconsin-Madison

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