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Research
Nanofabrication development occurs via two routes. New processes are emerging from standard lithography (the technology that allows newspapers to be printed) that can shrink fabrication to the nano and molecular level. The other approach is the scaling up of simpler systems.
Both approaches have their limitations. The scaling-down development, predicted by Intel co-founder Gordon Moore to continue to double capacity each year, cannot be sustained forever. And the scaling up, molecular-level approach is not yet capable of providing the control needed to produce useful devices.
CNTech uses both approaches to fabrication where the two methods intersect – approximately the scale length of 1 to 30 nm. Our goal is to develop new patterning techniques that enable broad, accurate and predictable fabrication of devices. To this end, we concentrate on the extension of existing techniques, including electro, optical and x-ray lithography, as well as new ones like scanning probes, interferometry and molecular assembly. The development of molecular growth techniques, such as DNA synthesis, will provide powerful new tools for the synthesis of new biological systems.
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