| |
 |
 |
|
| ACTIVITIES |
 |
|
 |
|
Lithography
 |
The electron beam microfabricator provides an exposure method for various research initiatives at the Center for NanoTechnology. It allows direct write of patterns in photoresist on silicon wafers for the purposes of testing resist sensitivity and characteristics or pattern generation for other purposes. It also provides a medium for patterning of optical and X-ray masks. In addition to providing unaffiliated users with access to an advanced lithography tool, the e-beam provides students with experience in advanced lithography tools. |
JEOL JBX-5D2-U E-Beam Lithography System Specifications
Recent patterns written in UV3 by the JEOL JBX-5D2-U E-Beam Lithography System
click on the image to see a larger version. |
|
|
|
top
|
|
| |
last
updated:
August 25,
2005 |
|
|
|
